Structural and Optical Properties of Pva Capped Nickel Oxide Thin Films Prepared by Chemical Bath Deposition
Keywords:
Nickel Oxide, thin films, Semiconductor, optical propertiesAbstract
Authors: S.C Ezugwu , F.I. Ezema, R.U. Osuji, P.U. Asogwa, A.B.C. Ekwealor, B.A. Ezekoye
Nickel oxide thin filins were deposited by a sünple and inexpensive chenücal bath deposition within the pores ofpolyvinyl alcohol fronl an aqueous solution coinposed ofnickel sulphate, potassiunt chloride and anvnonia at roonz tentperature. The films were characterized by using x-ray diffraction, Rutherford backscattering and optical absorption jneasurenents. XRD reveals the development of well-crystallized fihns. The value of the optical band gap energy, Eg, calculated from the absorption spectra ranged between 2.8 and 3.2eV.
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2020-06-27
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